Diligence memo · auto-generated · as of July 1, 2026

Stack Technologies, Inc.

Stack Technologies, Inc. looks under-valued against its niche peers and is at-risk on financing cadence.

WatchOverdue for a raise versus sector cadence — could be a bridge, a down round, or distress. Watch for the next filing.

Businessfiled

Stack Technologies, Inc. operates in Software / Tech, based in NEW YORK.

No verified homepage on file yet — operating evidence is limited to the public record.

Capital & rounds (filed)filed

Stack Technologies, Inc. has raised $2.5M in disclosed capital across 2 recorded rounds, aggregated from public filings. Its latest round is modeled as Seed (a $1.0M–$4.0M round).

Largest single filing: $2.0M on 2023-01-27.

Most recent recorded round closed around 2024-01-23.

Valuation (modeled)modeled

Provath models Stack Technologies, Inc. at approximately $3.1M (range $444K–$9.4M). This is an algorithmic estimate from round sizes and same-niche peers — not a quoted or reported figure.

Read: Under-valued. Modeled value is 0.19× the median modeled value of Seed Software / Tech companies in 2022–2024 (387 peers) — value vs value, same stage and era.

Financing rhythm & timingmixed

Historic cadence: a new round about every 12 months.

Last raise 2.4 yr ago; this sector typically re-raises about every 13 months.

Past due for a raise versus sector cadence — watch for distress or a bridge.

The last round was 4.0× smaller than the prior — a bridge or down round.

Comparablesmixed

Capital scale ranks ahead of 38% of Software / Tech peers (3920 compared).

Modeled value ranks above 11% of those peers.

Closest niche peers: SkyBell Technologies, Inc., BuyerAssist.io, Inc., Adaptive Surface Technologies, Inc., Abstract Labs, Inc., Elixir Lab Usa Inc..

Peoplefiled

2 named people on file across officers, directors and signatories.

Risks & flagsmixed

Overdue for a raise versus sector norm — distress or bridge risk.

No clearly named CEO/founder/principal in the surfaced records — key-person evidence is thin.